报告题目：Laser Chemical Vapor Deposition
报 告 人：Takashi Goto （New Industry Creation Center, Tohoku University, Japan；Wuhan University of Technology, China）
时 间：2019年5月6日13:00-15:00
地 点：海洋楼109
报告摘要：
Chemical vapor deposition (CVD) is a versatile technique to synthesize films with finely controlled microstructure, and therefore it has been employed in industry for electrical and mechanical applications. CVD generally needs high-temperature to promote chemical reactions for deposition, and CVD is rather inefficient process. Laser-assisted chemical vapor deposition (LCVD) is known to deposit films at low temperature; however, it is only possible to prepare very thin and small deposits. We have found that high power continuous laser enables one to prepare films at a significantly high deposition rate often more than several 1000 times higher than conventional LCVD at moderate temperature. Laser in LCVD can significantly accelerate chemical reactions, and therefore the deposition rate of LCVD is not limited by chemical reaction but mass transfer of source gases. The deposition rate increases with increasing the supply of source gases, and reached 27.5 mm/h for SiO2 film by using TEOS (Tetraethyl orthosilicate) and 5 mm/h for SiC film by using SiCl4 and CH4. Laser can also accelerate crystal growth of deposits, and thus highly (001)-oriented YBa2Cu3O7-d and (001)-oriented NaTaO3 films have been prepared exhibiting the highest superconductivity and photocatalytic activity, respectively. Al2O3-ZrO2, SiO2-ZrO2 and SiC-SiO2 nano-composite films have been also prepared by LCVD by using multicomponent source gases. By scanning laser or moving substrate, large scale coatings such as YSZ (yttria stabilized zirconia) thermal barrier coating were fabricated on a large scale and complicated shaped metal substrates.
後藤孝教授简介：
後藤孝教授在国际上率先开发出激光化学气相沉积技术，实现了薄膜材料的大面积、高速沉积，广泛应用于热障涂层、超硬涂层、生物涂层、光触媒薄膜、高温超导薄膜和铁电薄膜的研究和开发，相关研究成果获日本陶瓷协会研究学术赏（2002年）、粉末冶金协会研究功绩奖（2007年）。後藤孝教授先后承担了日本文部科学省、日本学术振兴会、新能源产业技术开发机构的20多项重大科研项目，是全球优秀人才中心（GCOE）材料融合项目的首席科学家，还多次组织国际学术会议，担任会议主席并受邀做大会报告。